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Article · 1983

Calorimetric determination of the formation energy for an amorphous layer on a crystalline silicon substrate

Publication

Title
Calorimetric determination of the formation energy for an amorphous layer on a crystalline silicon substrate
Author
Herbert C. Kerkow (Columbia College, Class of 1925)
Form
Article
First published
1983
Publisher
Physica Status Solidi (a)

Complete works of Herbert C. Kerkow (16)

  1. 1972 Photon emission during bombardment of solids with alkali ions in the energy range between 2 and 10 keV · Physica Status Solidi (a)
  2. 1979 Enhancements of Xe(M)-radiation during channelling of Xe-ions in copper crystals · Radiation Effects
  3. 1979 Measurement of the thickness of thin layers by proton- induced X-ray emission · Thin Solid Films
  4. 1980 A new experimental method to determine damage profiles by Rutherford backscattering · Physica Status Solidi (a)
  5. 1980 Comparative measurements of proton dechanneling in silicon under channeling, blocking and double alignment conditions · Radiation Effects
  6. 1980 Depth profile measurements of copper in silicon by ion-induced x-ray emission · Radiation Effects
  7. 1981 Ion-induced X-ray measurements of proton dechanneling in silicon covered with amorphous layers · Radiation Effects
  8. 1983 Calorimetric determination of the formation energy for an amorphous layer on a crystalline silicon substrate · Physica Status Solidi (a) this record
  9. 1983 Kinetics of furnace annealing of As-implanted silicon · Physica Status Solidi (a)
  10. 1983 Proton-induced L-shell X-ray emission cross-sections of elements with 24 ≦Z2 ≦ 50 for projectile energies between 30 and 350 keV · Physica Status Solidi (a)
  11. 1984 Investigation of ion-implanted semiconductors by ellipsometry and backscattering spectrometry · Thin Solid Films
  12. 1984 The influence of foreigen atoms on the epitaxial annealing of ion-implanted silicon · Physica Status Solidi (a)
  13. 1986 Anomalous Diffusion of Boron in Silicon Due to Heavy Ion Bombardment · physica status solidi (a)
  14. 1986 Flux Dependence of Damage Accumulation in Silicon during Ion Bombardment · physica status solidi (a)
  15. 1986 Ion-beam-assisted annealing of amorphized silicon · physica status solidi (a)
  16. 1987 Rate Effects during Radiation-Enhanced Diffusion of Boron in Silicon · Physica Status Solidi (a)

Cite this record

Kerkow, Herbert C.. Calorimetric determination of the formation energy for an amorphous layer on a crystalline silicon substrate. Physica Status Solidi (a), 1983.

Foundation record: https://philolexianfoundation.org/members/kerkow-herbert-c-cc-1925/calorimetric-determination-of-the-formation-energy-for-an-amorphous-layer-on-a-c-1983.html